Runway ML is a pioneering generative AI company founded in 2018 and based in New York City. They build advanced video and multimedia generation tools including Gen 1 through Gen 4 models that enable anyone, regardless of coding experience, to create and edit visuals using text prompts or images. Runway’s intuitive cloud-based platform democratizes creativity, supporting professionals in filmmaking, design, and storytelling by streamlining workflows for video synthesis, editing, and visual effects. By embedding cutting edge research into accessible products, Runway bridges the gap between imagination and production, reshaping how creative work is made in the digital age.
